Lithography Machine Mask Aligner Photo-Etching Machine
Product sumo
Iyo yekuvhenekesa mwenje sosi inotora kunze kunze kweUV LED uye mwenje sosi yekugadzira module, ine kupisa kudiki uye yakanaka mwenje sosi kugadzikana.
Iyo inverted yekuvhenekesa chimiro ine yakanaka kupisa kupisa mhedzisiro uye mwenje sosi yepedyo mhedzisiro, uye mercury mwenje kutsiva uye kugadzirisa zviri nyore uye zviri nyore. Yakashongedzerwa nepamusoro magnification binocular dual field microscope uye 21 inch wide screen LCD, inogona kuoneka yakarongeka kuburikidza
eyepiece kana CCD + kuratidza, ine yakakwirira kurongeka kwechokwadi, intuitive maitiro uye nyore kushanda.
Features
Ne fragment processing function
Leveling yekubata kumanikidza inovimbisa kudzokorora kuburikidza nesensor
Iyo gaka rekugadzirisa uye gap rekuratidzwa rinogona kusetwa nedhijitari
Kushandisa yakamisikidzwa komputa + yekubata chidzitiro mashandiro, akapusa uye ari nyore, akanaka uye ane rupo
Dhonza mhando kumusoro uye pasi ndiro, iri nyore uye yakanakira
Tsigira vacuum kuonana pachena, kuomarara kuratidzwa, kudzvanywa kuratidzwa uye kuratidzwa kwepedyo.
Ne nano imprint interface basa
Single layer kuratidzwa nekiyi imwe, yakakwirira degree ye automation
Muchina uyu une kuvimbika kwakanaka uye kuratidzira kuri nyore, kunyanya yakakodzera kudzidzisa, tsvakiridzo yesainzi uye mafekitori mumakoreji nemayunivhesiti.
Mamwe mashoko
Tsanangudzo
1. Kuratidzwa nzvimbo: 110mm × 110mm;
2. ★ Exposure wavelength: 365nm;
3. Kugadziriswa: ≤ 1m;
4. Kurongeka kwakarurama: 0.8m;
5.Nhamba yekufamba kwetafura yekuongorora yegadziriro yekugadzirisa inofanira kusangana: Y: 10mm;
6. Ruboshwe uye rworudyi chiedza machubhu ekugadzirisa maitiro anogona kufamba zvakasiyana mu X, y uye Z mazano, X nzira: ± 5mm, Y kutungamira: ± 5mm uye Z kutungamirira: ± 5mm;
7. Mask size: 2.5 inches, 3 inches, 4 inches, 5 inches;
8. Saizi yemuenzaniso: chidimbu, 2 ", 3", 4 ";
9. ★ Inokodzera sampuli ukobvu: 0.5-6mm, uye inogona kutsigira 20mm sampuli zvidimbu zvakanyanya (customized);
10. Exposure mode: nguva (countdown mode);
11. Kusafanana kwechiedza: ＜ 2.5%;
12. Dual field CCD alignment microscope: zoom lens (1-5 times) + microscope chinangwa lens;
13. Kurohwa kwekufamba kwemasikisi kunoenderana nemuenzaniso kunenge kuchisangana: X: 5mm; Y: 5mm; : 6º;
14. ★ Kuratidzwa kwesimba density: > 30MW / cm2,
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16. Leveling yekubata kumanikidza inovimbisa kudzokorora kuburikidza nesensor;
17. ★ The alignment gap uye exposure gap inogona kuiswa digitally;
18. ★ Iine nano imprint interface uye hukama hwepedyo;
19. ★ Bata sikirini kushanda;
20. Kuyera kwese: Kunenge 1400mm (kureba) 900mm (hupamhi) 1500mm (kureba).
